Actually China is having problems smaller than 14nm.
They can build them but they don’t operate at full speed and yield is very poor.
Without EUV lithography, 7nm and smaller is virtually impossible.
Both Intel and Global Foundry discovered this.
Intel pushed very late into EUV and GF abandoned anything smaller than 14nm.
ASML is the only way to make EUV work and it took them 25 years to make it work.
I was going off of google. You sound like you’re better informed. Thanks for filling me in.👍
CC